Printing line
Pan-semiconductor
Screen printing
Photovoltaic cells
Maximum mesh frame: 2000×1500mm
Process analysis (L/S): 40/40µm
Exposure mesh frame thickness: 20mm-40mm
Exposure photosensitive adhesive thickness: 2-130μm (including screen thickness)
Capaion capacity:
85s-110s/side
@900mm×900mm
& 30mj/cm²
Maximum mesh frame: 1300×1200mm
Process analysis (L/S): 40/40µm
Exposure mesh frame thickness: 20mm-40mm
Exposure photosensitive adhesive thickness: 2-130μm (silk thickness)
Capaion capacity:
75s-100s/side
@900mm×900mm
& 30mj/cm²
Maximum mesh frame: 1200×1000mm
Process analysis (L/S): 40/40µm
Exposure mesh frame thickness: 20mm-40mm
Exposure photosensitive adhesive thickness: 2-130μm (including screen thickness)
Capaion capacity:
135s-180s/side
@900mm×900mm
& 30mj/cm²
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