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2020-03-10
59
Successful delivery | The first set of DiSS-30HL equipment delivered to customers and mass production
PUBLISHED ON 2020-03-10 12:18
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People's hearts are moving, and Yuanzhuo Optoelectronics DiSS-30HL has been successfully delivered to customers!
At the beginning of 2020, Yuanzhuo people wrote big "dry" characters with their hands.
Since the resumption of work on February 14, Yuanzhuoren has actively participated in their work. The colleagues led by the lithography product technology center have made every effort to successfully deliver the first one to customers and start mass supply in the DiSS-30HL project in 3 months!
DiSS-30HL application advantages
※ 6 pieces/minute of ordinary dry film 8 pieces/minute;
※ Suitable for the mass production line exposure of ordinary dry film/ink, maximize the cost of dry film use, improve product yield, and improve product competitiveness;
※ The opposition accuracy is as low as ±10μm, and the interlayer opposition accuracy is ±20μm;
※ The fixed architecture design of the optical lens can better ensure the long-term stability of the accuracy of the equipment compared with the left and right precision lens of the mobile left and right dual table DI architecture;
※ With a depth of field of up to ±300μm, it can overcome challenging surface uneven plates to ensure imaging quality.
DiSS-30HL innovation
※ Independent intellectual property high-precision interactive dual-table platform;
※ 12-way One-Scan optical lens configuration to ensure the best production demand;
※ A single wavelength light source provides better exposure quality;
※ Ultra-high-power laser light source and customized DMD achieve stable production of up to 48W/head;
※ Japanese master optical design achieves high-efficiency conversion efficiency and ensures low-cost and high-efficiency exposure process;
※ The unique optical lens coating ensures the high efficiency and long life of the lens;
※ The advanced system architecture design can achieve ultra-high-capacity anti-welding exposure by replacing multi-wavelength lenses.
DiSS-30HL will help customers reduce operating costs and improve production efficiency.
Yuanzhuo people take "being a great enterprise" as their vision, take "changing human life with micro-nano processing" as their mission, and adhere to the principle of "customer first, sincere responsibility, passionate innovation, efficient and win-win". In the future, they will focus more on solving pain points and difficulties for customers, and assist customers to improve product levels and reduce production and operation. Cost, achieve a win-win situation for both sides!
Company Profile
Suzhou Yuanzhuo Optoelectronic Technology Co., Ltd. (Advanced Micro Optics Instruments, Inc. (MIKOPTIK)) was founded by a number of senior technicians working in internationally renowned semiconductor equipment enterprises. ED, laser light source technology and digital optical processing (DLP) technology are combined with high-tech companies in the fields of PCB&FPC, FPD&TP, LED, solar energy, wafer, IC packaging and high-precision screen printing, focusing on the research and production of various digital step scanning (Digital -Step-Scan, referred to as DiSS) optical equipment and related components and devices.
The company's core R&D team has developed a new generation of digital exposure technology (DiSS) that can match the cost performance of film/mask exposure machines on the basis of the original laser direct imaging technology (LDI), which is a printed circuit board (PCB&FPC), semiconductor (IC FAB) and semiconductor-like (MEM). S, LED, biochip and micro optics), flat panel display (FPD, TFT-LCD, OLED) and touch screen (TP), screen printing (Screen Printing) industrial exposure process to lay the foundation for comprehensive intelligent, clean and environmentally friendly production! At the same time, it provides customers with a more precise, economical, efficient, intelligent and environmentally friendly digital exposure machine solution that replaces the traditional exposure machine (Filin/mask exposure machine).